Thin SiCx layers prepared by hybrid laser-magnetron deposition

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F08%3A00316448" target="_blank" >RIV/68378271:_____/08:00316448 - isvavai.cz</a>

Alternative codes found

RIV/68407700:21460/08:12148102

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Thin SiCx layers prepared by hybrid laser-magnetron deposition

Original language description

Thin SiCx films were fabricated by hybrid laser-magnetron deposition systems.KrF excimer laser was used for deposition of carbon and magnetron at the same time for sputtering of Si species. Films topology,crystallinity,composition, chemical bonds and optical emission spectra were studied. Films were smooth and amorphous.

Czech name

Tenké SiCx vrstvy připravené hybridní laser-magnetronovou deposicí

Czech description

Tenké vrstvy SiC byly připraveny hybridní laser=magnetronovou depozcí. KrF byl použit pro depozici uhlíku a magnetron souběžně deponoval Si materiál. Byla sledována topologie, krystalinita, složení, chem.vazby.

Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BH - Optics, masers and lasers

OECD FORD branch

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Project

<a href="/en/project/GA202%2F06%2F0216" target="_blank" >GA202/06/0216: Study of plasma formed in hybrid arrangement of pulsed laser deposition</a><br>

Continuities

Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2008

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Applied Physics A - Materials Science & Processing

ISSN

0947-8396

e-ISSN

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Volume of the periodical

93

Issue of the periodical within the volume

3

Country of publishing house

DE - GERMANY

Number of pages

5

Pages from-to

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UT code for WoS article

000260218400010

EID of the result in the Scopus database

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