Chemistry of plasma-polymerized vinyltriethoxysilane controlled by deposition conditions
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F08%3A00319883" target="_blank" >RIV/68378271:_____/08:00319883 - isvavai.cz</a>
Alternative codes found
RIV/61389005:_____/08:00319883 RIV/00216305:26310/08:PU77700
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Chemistry of plasma-polymerized vinyltriethoxysilane controlled by deposition conditions
Original language description
Plasma-polymerized vinyltriethoxysilane films were analyzed by various spectroscopic techniques (RBS, ERDA, XPS, FTIR) in order to compare their chemical structure and composition.
Czech name
Chemie vinyl triethoxysilanu polymerizovaného v plazmě za různých depozičních podmínek
Czech description
Tenké vrstvy vinyl triethoxysilanu byly analyzovány různými spektroskopickými metodami (RBS, ERDA, XPS, FTIR)za účelem srovnání jejich chemické struktury a složení.
Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BM - Solid-state physics and magnetism
OECD FORD branch
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Result continuities
Project
<a href="/en/project/GA104%2F06%2F0437" target="_blank" >GA104/06/0437: Progress in plasmachemical processes for the development of smart polymer nanostructures</a><br>
Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2008
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Plasma Processes and Polymers
ISSN
1612-8850
e-ISSN
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Volume of the periodical
5
Issue of the periodical within the volume
8
Country of publishing house
DE - GERMANY
Number of pages
8
Pages from-to
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UT code for WoS article
000260514900003
EID of the result in the Scopus database
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