Toward surface-friendly treatment of seeding layer and selected-area diamond growth
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F10%3A00354793" target="_blank" >RIV/68378271:_____/10:00354793 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Toward surface-friendly treatment of seeding layer and selected-area diamond growth
Original language description
Several technological approaches of applying photoresistive polymer for patterning the diamond seeding layer while minimizing damage of substrate surface is reported. Reactive ion etching (i.e., dry process) and wet photolithographical processing using two polymer layers are compared and combined as treatment techniques. Subsequently, diamond structures are deposited by microwave plasma enhanced chemical vapor deposition from a gas mixture of methane diluted in hydrogen. The highest efficiency for selected-area deposition, with the parasitic density as low as the technological limit of 105?cm2, was achieved by combining the two treatment techniques. Technological advantages and limitation of dry and wet treatment process are pointed out.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BM - Solid-state physics and magnetism
OECD FORD branch
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Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2010
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Physica Status Solidi B-Basic Solid State Physics
ISSN
0370-1972
e-ISSN
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Volume of the periodical
247
Issue of the periodical within the volume
11-12
Country of publishing house
DE - GERMANY
Number of pages
4
Pages from-to
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UT code for WoS article
000285798400091
EID of the result in the Scopus database
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