Direct Growth of Sub-Micron Diamond Structures
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21340%2F12%3A00200419" target="_blank" >RIV/68407700:21340/12:00200419 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1016/j.vacuum.2011.08.011" target="_blank" >http://dx.doi.org/10.1016/j.vacuum.2011.08.011</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.vacuum.2011.08.011" target="_blank" >10.1016/j.vacuum.2011.08.011</a>
Alternative languages
Result language
angličtina
Original language name
Direct Growth of Sub-Micron Diamond Structures
Original language description
By employing optical and electron beam lithography, micrometer and sub-micrometer wide polymer structures were fabricated on a diamond nano-particle layer. After selective removal of the diamond nano-particles (seeds) in the buffer oxide etchant, all samples were exposed to microwave plasma-assisted chemical vapor deposition. Well-defined diamond channels (in widths from 5 ?m down to 250 nm) were realized. The advantages and limitations of the wet treatment process and the lithographical polymer application as a masking material are discussed in this study.
Czech name
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Czech description
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Classification
Type
O - Miscellaneous
CEP classification
BM - Solid-state physics and magnetism
OECD FORD branch
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Result continuities
Project
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Continuities
S - Specificky vyzkum na vysokych skolach
Others
Publication year
2012
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů