In-situ monitoring of the influence of inert gases (Ne, Ar, Kr, Xe) on plasma properties and the growth of magnetron sputtered nanostructured silver thin film

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F11%3A00390588" target="_blank" >RIV/68378271:_____/11:00390588 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

In-situ monitoring of the influence of inert gases (Ne, Ar, Kr, Xe) on plasma properties and the growth of magnetron sputtered nanostructured silver thin film

Original language description

Ultrathin nanostructured silver films exhibit unusual properties and performances. Functional properties of the film depend strongly on the nanostructure that can be manipulated by varying nucleation and growth conditions, which are in the case of RF magnetron sputtering closely related to plasma parameters. The sputtering process and the film growth are significantly influenced by the mass ratio of deposited atoms and sputtering gas ions. Deposition conditions promoting the growth of nanostructured film can be established via varying plasma parameters, i.e. mass, energy and flux of atoms and ions impinging the substrate and the ratio of atoms and ions.

Czech name

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Czech description

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Type

O - Miscellaneous

CEP classification

BM - Solid-state physics and magnetism

OECD FORD branch

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Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2011

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů