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Mass spectrometry investigation of magnetron sputtering discharges

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F17%3A43932215" target="_blank" >RIV/49777513:23520/17:43932215 - isvavai.cz</a>

  • Alternative codes found

    RIV/68378271:_____/17:00477676

  • Result on the web

    <a href="http://dx.doi.org/10.1016/j.vacuum.2017.06.032" target="_blank" >http://dx.doi.org/10.1016/j.vacuum.2017.06.032</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1016/j.vacuum.2017.06.032" target="_blank" >10.1016/j.vacuum.2017.06.032</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Mass spectrometry investigation of magnetron sputtering discharges

  • Original language description

    This paper deals with the mass spectrometric characterization of atoms, radicals and ions generated in the RF magnetron discharges sputtering metal targets in Ne, Ar, Kr and Xe gases. In magnetron discharges different kinds of species such as atoms, radicals and positive and negative ions according to the target material and sputtering gas pressure can be generated. The mass spectrometry of the magnetron discharge, which gives the detailed information on these species, is of key importance for the development of new advanced thin films. The amount of individual atoms, radicals and ions and the ion energy distribution as a function of flow and pressure of the sputtering gas, and the magnetron power is discussed in detail. This article shows (1) the ion distribution functions of gas and sputtered target material ions as a function of sputtering gas pressure, (2) the evolution of the amount of single-ionized and double-ionized atoms of gases and metals generated in the RF discharge during sputtering of Ag films in various inert gases as a function of gas pressure, and (3) the contamination of the sputtered metallic films by the oxygen from a residual gas atmosphere in the deposition chamber at low film deposition rates.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database

  • CEP classification

  • OECD FORD branch

    10305 - Fluids and plasma physics (including surface physics)

Result continuities

  • Project

    Result was created during the realization of more than one project. More information in the Projects tab.

  • Continuities

    I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Others

  • Publication year

    2017

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Vacuum

  • ISSN

    0042-207X

  • e-ISSN

  • Volume of the periodical

    143

  • Issue of the periodical within the volume

    SEP 2017

  • Country of publishing house

    GB - UNITED KINGDOM

  • Number of pages

    6

  • Pages from-to

    438-443

  • UT code for WoS article

    000407654900062

  • EID of the result in the Scopus database

    2-s2.0-85021811235