Contamination of magnetron sputtered metallic films by oxygen from residual atmosphere in deposition chamber

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F15%3A00449004" target="_blank" >RIV/68378271:_____/15:00449004 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1002/ppap.201400172" target="_blank" >http://dx.doi.org/10.1002/ppap.201400172</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1002/ppap.201400172" target="_blank" >10.1002/ppap.201400172</a>

Result language
angličtina
Original language name
Contamination of magnetron sputtered metallic films by oxygen from residual atmosphere in deposition chamber
Original language description
The article reports on the contamination of Ag thin films sputtered from a pure Ag target in Ar and Ne gas by the RF magnetron by gas atoms contained in residual gas atmosphere in the deposition chamber at different values of the base pressure. The amount of O atoms generated at different values of base pressure is compared with the amount of Ag atoms sputtered at different deposition rates of Ag film. This comparison reveals a great problem in the formation of pure metallic films at low deposition rates and high values of the base pressure. No pure Ag films can be deposited at low in deposition chambers evacuated with diffusion or root pumps to the base pressures lower than 1mPa only.
Czech name
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Czech description
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Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BM - Solid-state physics and magnetism
OECD FORD branch
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Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year
2015
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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