Optimisation of deposition parameters of Ionised Jet Deposition (IJD) created Titanium nitride thin films

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21340%2F24%3A00378630" target="_blank" >RIV/68407700:21340/24:00378630 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Optimisation of deposition parameters of Ionised Jet Deposition (IJD) created Titanium nitride thin films
Original language description
Titanium nitride is often used as a protective coating due to its hardness. This material is mostly deposited by pulsed laser deposition or magnetron sputtering. Ionized jet deposition has a potential to improve and diversify ways of making titanium nitride thin films. We optimised the nitrogen pressure in the IJD chamber to suppress concentration of titanium oxide in films. We manufactured a set of films using different deposition pressures. Based on the XRD data, higher gas pressure is preferable. In contrast, lower gas pressure contributes to higher film growth, based on AFM data.
Czech name
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Czech description
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Type
D - Article in proceedings
CEP classification
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OECD FORD branch
10302 - Condensed matter physics (including formerly solid state physics, supercond.)

Publication year
2024
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
Sborník příspěvků 13. studentské vědecké konference fyziky pevných látek, fotoniky a materiálů
ISBN
978-80-01-07382-7
ISSN
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e-ISSN
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Number of pages
8
Pages from-to
39-46
Publisher name
ČVUT, Fakulta jaderná a fyzikálně inženýrská, Katedra inženýrství pevných látek
Place of publication
Praha
Event location
Byňov-Nové Hrady
Event date
Sep 3, 2024
Type of event by nationality
CST - Celostátní akce
UT code for WoS article
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