Mass spectrometric characterizations of ions generated in RF magnetron discharges during sputtering of silver in Ne, Ar, Kr and Xe gases

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F13%3A00397579" target="_blank" >RIV/68378271:_____/13:00397579 - isvavai.cz</a>

Result on the web

<a href="http://dx.doi.org/10.1002/ppap.201200145" target="_blank" >http://dx.doi.org/10.1002/ppap.201200145</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1002/ppap.201200145" target="_blank" >10.1002/ppap.201200145</a>

Result language

angličtina

Original language name

Mass spectrometric characterizations of ions generated in RF magnetron discharges during sputtering of silver in Ne, Ar, Kr and Xe gases

Original language description

The article reports mass spectrometric characterizations of ions generated in RF magnetron discharges generated using silver targets and Ne, Ar, Kr and Xe gases. Both the amount of ions and ion energies in magnetron discharges were investigated. The following ions X+, Ag+, (XAg)+, X2+, Ag2+, X++ and Ag++ were found in the RF discharges; here X=Ne, Ar, Kr, Xe is the inert gas atom and Ag is the silver atom. The amount of individual ions, their energies and ion energy distribution (IED) functions as a function of sputtering gas pressure were measured. It is shown that the sputtering gas pressure strongly influences the generation of ions, their amount and energy in the RF magnetron discharges. The knowledge of the energies and amounts of individual ionsis of a key importance in the deposition of thin films with controlled properties using RF magnetron discharges.

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BM - Solid-state physics and magnetism

OECD FORD branch

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Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year

2013

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Plasma Processes and Polymers

ISSN

1612-8850

e-ISSN

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Volume of the periodical

10

Issue of the periodical within the volume

7

Country of publishing house

DE - GERMANY

Number of pages

10

Pages from-to

593-602

UT code for WoS article

000322371700002

EID of the result in the Scopus database

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