Global sensitivity analysis of the XUV-ABLATOR code

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F13%3A00424964" target="_blank" >RIV/68378271:_____/13:00424964 - isvavai.cz</a>
Alternative codes found
RIV/61388955:_____/13:00424964 RIV/61989100:27240/13:86087159 RIV/61989100:27200/13:86087159
Result on the web
<a href="http://dx.doi.org/10.1117/12.2017542" target="_blank" >http://dx.doi.org/10.1117/12.2017542</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1117/12.2017542" target="_blank" >10.1117/12.2017542</a>

Result language
angličtina
Original language name
Global sensitivity analysis of the XUV-ABLATOR code
Original language description
Availability of numerical model providing reliable estimation of the parameters of ablation processes induced by extreme ultraviolet laser pulses in the range of nanosecond and sub-picosecond timescales is highly desirable for recent experimental research as well as for practical purposes. Performance of the one-dimensional thermodynamic code (XUV-ABLATOR) in predicting the relationship of ablation rate and laser fluence is investigated for three reference materials: (i) silicon, (ii) fused silica and (iii) polymethyl methacrylate. The effect of pulse duration and different material properties on the model predictions is studied in the frame of this contribution for the conditions typical for two compact laser systems operating at 46.9 nm. Global sensitivity analysis using high dimensional model representation in combination with quasi-random sampling was applied in order to identify the most critical input data as well as to explore the uncertainty range of model results.
Czech name
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Czech description
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Project
<a href="/en/project/GAP108%2F11%2F1312" target="_blank" >GAP108/11/1312: Fabrication of thin films of UV-Vis-NIR transparent dielectrics by repetitive, capillary-discharge XUV laser ablation</a><br>
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year
2013
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
Damage to VUV, EUV, and X-ray Optics IV; and EUV and X-ray Optics: Synergy between Laboratory and Space III
ISBN
9780819495792
ISSN
—
e-ISSN
—
Number of pages
8
Pages from-to
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Publisher name
SPIE
Place of publication
Bellingham
Event location
Praha
Event date
Apr 15, 2013
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
000329577700009

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