Surface wave plasma ? attractive solution for industrial uses

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F14%3A00434339" target="_blank" >RIV/68378271:_____/14:00434339 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Surface wave plasma ? attractive solution for industrial uses

Original language description

This work presents the low temperature oxygen and hydrogen termination of diamond films by surface wave discharge reactor. The influence of the low temperature plasma treatment and process time on the wettability and/ or surface resistivity of the diamond films have been studied. The results indicate that a temperature as low as 250°C is sufficient to induce hydrogen-terminated conductive surface of the order of 108 ?. An increase in substrate temperature up to 400°C results in decrease of resistivity up to 5106 ?.

Czech name

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Czech description

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Type

D - Article in proceedings

CEP classification

BM - Solid-state physics and magnetism

OECD FORD branch

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Project

<a href="/en/project/TA01011740" target="_blank" >TA01011740: Hybrid high-density low-temperature microwave plasma sources in matrix configuration suitable for growth of advanced materials and their (nano) composites on 2D and 3D substrates</a><br>

Continuities

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year

2014

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection

Material analysis in vacuum

ISBN

978-80-971179-4-8

ISSN

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e-ISSN

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Number of pages

5

Pages from-to

129-133

Publisher name

Slovenská vákuová spoločnosť

Place of publication

Bratislava

Event location

Štrbské Pleso

Event date

Oct 2, 2014

Type of event by nationality

EUR - Evropská akce

UT code for WoS article

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