Deposition of carbon nanostructures by surfatron generated discharge

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F14%3A00440056" target="_blank" >RIV/68378271:_____/14:00440056 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.14311/AP.2014.54.0389" target="_blank" >http://dx.doi.org/10.14311/AP.2014.54.0389</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.14311/AP.2014.54.0389" target="_blank" >10.14311/AP.2014.54.0389</a>

Result language
angličtina
Original language name
Deposition of carbon nanostructures by surfatron generated discharge
Original language description
Various carbon nanostructures were deposited by surface wave discharge from an Ar/CH4/CO2 gas mixture. The type and the form of the carbon nanostructure were controlled by the gas mixture and the gas inlet. The nanostructures that formed were investigated by scanning electron microscopy and by Raman measurements. The influence of the geometrical combination of the gas inlets (via surfatrons or via the gas shower system) into the chamber is found to be a crucial deposition parameter for the controllablegrowth of desired carbon nanostructures.
Czech name
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Czech description
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Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year
2014
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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