Interaction of Extreme Ultraviolet Laser Radiation with Solid Surface: Ablation, Desorption, Nanostructuring

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F15%3A00445337" target="_blank" >RIV/68378271:_____/15:00445337 - isvavai.cz</a>
Alternative codes found
RIV/61389021:_____/15:00445337
Result on the web
<a href="http://dx.doi.org/10.1117/12.2071273" target="_blank" >http://dx.doi.org/10.1117/12.2071273</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1117/12.2071273" target="_blank" >10.1117/12.2071273</a>

Result language
angličtina
Original language name
Interaction of Extreme Ultraviolet Laser Radiation with Solid Surface: Ablation, Desorption, Nanostructuring
Original language description
It was confirmed that nanostructuring can be realised only in the desorption area.In this area the efficiency of particle-removal from a thin surface layer (of the thickness of laser penetration depth) is very small(<10%) for short (femtosecond) laser pulses and for long (nanosecond) pulses and difficult removable material (like GaAs, Si, ).In this case the profile of pattern imprinted by one shot is shallow (units of nanometers only. However,for long (nanosecond) pulses and easily removable material (like PMMA)this changes from 0% at the beam periphery up to 90% at the ablation contour and, therefore,the profile of imprinted pattern can be relatively deep(up to 200-300 nm by one shot).A suggested interpretation explains this fact in terms of gradual release of target material during laser pulse, which is accompanied by gradually increased laser penetration depth.However, simultaneously laser attenuation in ablated plum should be considered.The detail dynamics of this process is
Czech name
—
Czech description
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Project
<a href="/en/project/GA14-29772S" target="_blank" >GA14-29772S: Surface nanostructuring by extreme ultraviolet and X-ray laser radiation</a><br>
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year
2015
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
Proceeding of SPIE Vol. 9255: 20th International Symposium on High Power Systems and Applications 2014, HPLS and A 2014
ISBN
978-1-62841-322-9
ISSN
0277-786X
e-ISSN
—
Number of pages
9
Pages from-to
—
Publisher name
SPIE-INT SOC OPTICAL ENGINEERING
Place of publication
Bellingham
Event location
Chengdu
Event date
Aug 25, 2014
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
000350338500136

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