Nanoscale Characterization of Ultra-thin Tungsten Films Deposited by Radio-Frequency Magnetron Sputtering
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F15%3A00447554" target="_blank" >RIV/68378271:_____/15:00447554 - isvavai.cz</a>
Alternative codes found
RIV/68081731:_____/15:00447554
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Nanoscale Characterization of Ultra-thin Tungsten Films Deposited by Radio-Frequency Magnetron Sputtering
Original language description
In this article, atomic force microscopy was used for nanoscale characterization of ultra-zhin tungsten films wich were deposited on silicon substrate. Radio-frequency magnetron sputtering was used for tungsten deposition on the sueface.
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
JA - Electronics and optoelectronics
OECD FORD branch
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Result continuities
Project
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Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2015
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
IEEE NANO 2015 Proceedings. 15th International Conference on Nanotechnology
ISBN
978-1-4673-8156-7
ISSN
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e-ISSN
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Number of pages
4
Pages from-to
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Publisher name
IEEE
Place of publication
Danvers
Event location
Rome
Event date
Jul 27, 2015
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
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