Diagnostics of ultra-thin tungsten films on silicon substrate using atomic force microscopy
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F70883521%3A28140%2F14%3A43871862" target="_blank" >RIV/70883521:28140/14:43871862 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Diagnostics of ultra-thin tungsten films on silicon substrate using atomic force microscopy
Original language description
In this article, atomic force microscopy method was used for diagnostics of ultra-thin tungsten films which were deposited on silicon substrate. Radio frequency magnetron sputtering method was used for tungsten deposition on the surface. According to atomic forces between the tip and the sample, topographical structures were measured and imaged.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
JB - Sensors, detecting elements, measurement and regulation
OECD FORD branch
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Result continuities
Project
<a href="/en/project/ED2.1.00%2F03.0089" target="_blank" >ED2.1.00/03.0089: The Centre of Security, Information and Advanced Technologies (CEBIA-Tech)</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2014
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
International Journal of Materials
ISSN
2313-0555
e-ISSN
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Volume of the periodical
2014
Issue of the periodical within the volume
1
Country of publishing house
US - UNITED STATES
Number of pages
7
Pages from-to
142-148
UT code for WoS article
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EID of the result in the Scopus database
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