Features of copper coatings growth at high-rate deposition using magnetron sputtering systems with a liquid metal target

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F17%3A00478821" target="_blank" >RIV/68378271:_____/17:00478821 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1016/j.surfcoat.2017.05.065" target="_blank" >http://dx.doi.org/10.1016/j.surfcoat.2017.05.065</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.surfcoat.2017.05.065" target="_blank" >10.1016/j.surfcoat.2017.05.065</a>

Result language
angličtina
Original language name
Features of copper coatings growth at high-rate deposition using magnetron sputtering systems with a liquid metal target
Original language description
The article focuses on the study of growth conditions for metal coatings during the operation of magnetron sputtering systems with a liquid-phase target. It also discusses the trends of coating properties formation (in terms of copper example) depending on the growth conditions. The data of the experiments and calculations confirm that the appearance of intensive evaporation on the target surface allows increasingmore than 10 times the deposition rate and deposited particles flux density in comparison to conventional sputtering with a cooled solid target at the same magnetron power.
Czech name
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Czech description
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Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10302 - Condensed matter physics (including formerly solid state physics, supercond.)

Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year
2017
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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