Creation and behavior of radicals and ions in the Acetylene/Argon microwave ECR discharge
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F17%3A00485280" target="_blank" >RIV/68378271:_____/17:00485280 - isvavai.cz</a>
Alternative codes found
RIV/60461373:22340/17:43913692
Result on the web
<a href="http://dx.doi.org/10.1002/ppap.201700062" target="_blank" >http://dx.doi.org/10.1002/ppap.201700062</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1002/ppap.201700062" target="_blank" >10.1002/ppap.201700062</a>
Alternative languages
Result language
angličtina
Original language name
Creation and behavior of radicals and ions in the Acetylene/Argon microwave ECR discharge
Original language description
Formation and number of molecules, radicals, and ions in ECR acetylene/argon discharge is studied as functions of gas flow rate, supplied power, and partial pressure of acetylene. The spectra obtained by neutral mass spectrometry (NMS) exhibit the presence of atomic hydrogen and H2 molecules. The quantity of acetylene ions is rather high in the range of power up to 350 W, but it drops down with increasing power. At higher powers, the change to C2H+ ion takes place and its quantity grows with increasing power. The dependence of the number of C2+, C2H+, C2H2+ on the electron energy is judged by appearance potential mass spectrometry in the energy range 0–100 eV. The obtained findings are useful for the technology of industrial preparation of DLC thin films.n
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10302 - Condensed matter physics (including formerly solid state physics, supercond.)
Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2017
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Plasma Processes and Polymers
ISSN
1612-8850
e-ISSN
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Volume of the periodical
14
Issue of the periodical within the volume
12
Country of publishing house
DE - GERMANY
Number of pages
9
Pages from-to
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UT code for WoS article
000417859300006
EID of the result in the Scopus database
2-s2.0-85022327181