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A detailed investigation of radicals and ions in ECR methane/argon microwave discharge

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F16%3A00466137" target="_blank" >RIV/68378271:_____/16:00466137 - isvavai.cz</a>

  • Result on the web

    <a href="http://dx.doi.org/10.1002/ppap.201500221" target="_blank" >http://dx.doi.org/10.1002/ppap.201500221</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1002/ppap.201500221" target="_blank" >10.1002/ppap.201500221</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    A detailed investigation of radicals and ions in ECR methane/argon microwave discharge

  • Original language description

    In this work, we focus on study of the formation and behavior of molecules, radicals, and ions in ECR discharge in a mixture of argon and methane. Discharge properties are studied at various conditions; total gas flow (0–50 sccm), absorbed microwave power (0–900 W) and the partial pressure of methane (0–1.2 Pa). Neutral mass spectrometry does not reveal the presence of radical CH5 commonly described in literature. Spectra show the presence of atomic hydrogen H and especially H2 molecules. The number of CH4 + and CH3 + species shows that the amount of CH4 + in areas power up to 350 W is high, but with further increase of the power their amount decreases. With the increasing power the CH3 + ons are more intensively generated. The obtained data helps optimize process conditions for the fabrication of diamond and DLC thin films.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

  • CEP classification

    BM - Solid-state physics and magnetism

  • OECD FORD branch

Result continuities

  • Project

    Result was created during the realization of more than one project. More information in the Projects tab.

  • Continuities

    I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Others

  • Publication year

    2016

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Plasma Processes and Polymers

  • ISSN

    1612-8850

  • e-ISSN

  • Volume of the periodical

    13

  • Issue of the periodical within the volume

    10

  • Country of publishing house

    DE - GERMANY

  • Number of pages

    11

  • Pages from-to

    970-980

  • UT code for WoS article

    000389205500003

  • EID of the result in the Scopus database

    2-s2.0-84977127285