The changes induced on oriented ZnO surface by inductively coupled plasma (ICP)

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F21%3A00549949" target="_blank" >RIV/68378271:_____/21:00549949 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

The changes induced on oriented ZnO surface by inductively coupled plasma (ICP)

Original language description

The plasma treatment has been done in a novel inductively coupled plasma (ICP) quartz reactor recently developed in the cooperation with the Czech company SVCS Process Innovation s. r. o. in Valazske Mezirici. The reactor operates at the radio frequency 13.56 MHz with up to 300 W discharge power and H2, O2, N2 and Ar process gasses at low pressure about 20 Pa. X-ray photoelectron spectroscopy (XPS) showed contamination of plasma processed ZnO powder surface by silicon and fluorine from quartz walls and polytetrafluoroethylene (PFTE) sealing that disappeared after reducing a parasitic capacitive coupling between antenna and grounded stainless steel holder. We measure topography and surface potential of ZnO nanorods and monocrystalline ZnO samples after different plasma treatments by atomic force microscopy (AFM) and Kelvin probe force microscopy (KFPM). Preliminary results show similar morphology before and after plasma treatment, but different average surface potential values.

Czech name

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Czech description

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Type

O - Miscellaneous

CEP classification

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OECD FORD branch

10302 - Condensed matter physics (including formerly solid state physics, supercond.)

Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2021

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů