Surface stoichiometry and depth profile of Tix-CuyNz thin films deposited by magnetron sputtering

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F21%3A00552187" target="_blank" >RIV/68378271:_____/21:00552187 - isvavai.cz</a>
Result on the web
<a href="http://hdl.handle.net/11104/0327392" target="_blank" >http://hdl.handle.net/11104/0327392</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.3390/ma14123191" target="_blank" >10.3390/ma14123191</a>

Result language
angličtina
Original language name
Surface stoichiometry and depth profile of Tix-CuyNz thin films deposited by magnetron sputtering
Original language description
We report the surface stoichiometry of Tix-CuyNz thin film as a function of film depth. Films are deposited by high power impulse (HiPIMS) and DC magnetron sputtering (DCMS). The composition of Ti, Cu, and N in the deposited film is investigated by X-ray photoelectron spectroscopy (XPS). At a larger depth, the relative composition of Cu and Ti in the film is increased compared to the surface. The amount of adventitious carbon which is present on the film surface strongly decreases with film depth. Deposited films also contain a significant amount of oxygen whose origin is not fully clear. Grazing incidence X-ray diffraction (GIXD) shows a Cu3N phase on the surface, while transmission electron microscopy (TEM) indicates a polycrystalline structure and the presence of a Ti3CuN phase.
Czech name
—
Czech description
—

Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
—
OECD FORD branch
10305 - Fluids and plasma physics (including surface physics)

Project
—
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year
2021
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Similar results(10)