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Combining advanced photoelectron spectroscopy approaches to analyse deeply buried GaP(As)/Si(1 0 0) interfaces: Interfacial chemical states and complete band energy diagrams

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F22%3A00562785" target="_blank" >RIV/68378271:_____/22:00562785 - isvavai.cz</a>

  • Result on the web

    <a href="https://doi.org/10.1016/j.apsusc.2022.154630" target="_blank" >https://doi.org/10.1016/j.apsusc.2022.154630</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1016/j.apsusc.2022.154630" target="_blank" >10.1016/j.apsusc.2022.154630</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Combining advanced photoelectron spectroscopy approaches to analyse deeply buried GaP(As)/Si(1 0 0) interfaces: Interfacial chemical states and complete band energy diagrams

  • Original language description

    The epitaxial growth of the polar GaP(100) on the nonpolar Si(100) substrate suffers from inevitable defects at the antiphase domain boundaries, resulting from mono-atomic steps on the Si(100) surface. Stabilization of Si(100) substrate surfaces with As is a promising technological step enabling the preparation of Si substrates with double atomic steps and reduced density of the APDs. In this paper, GaP epitaxial films were grown on As-terminated Si(100) substrates by MOVPE. The GaP(As)/Si(100) heterostructures were investigated by XPS, GCIB, HAXPES. We found residuals of As atoms in the GaP lattice and a localization of As atoms at the GaP(As)/Si(100) interface. Deconvolution of core level peaks revealed interface core level shifts. Similar valence band offset (VBO) values of 0.6 eV were obtained, regardless of the doping type of Si substrate, Si substrate miscut or type of As-terminated Si substrate surface. The band alignment diagram of the heterostructure was deduced.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database

  • CEP classification

  • OECD FORD branch

    10302 - Condensed matter physics (including formerly solid state physics, supercond.)

Result continuities

  • Project

    Result was created during the realization of more than one project. More information in the Projects tab.

  • Continuities

    I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Others

  • Publication year

    2022

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Applied Surface Science

  • ISSN

    0169-4332

  • e-ISSN

    1873-5584

  • Volume of the periodical

    605

  • Issue of the periodical within the volume

    Dec.

  • Country of publishing house

    NL - THE KINGDOM OF THE NETHERLANDS

  • Number of pages

    11

  • Pages from-to

    154630

  • UT code for WoS article

    000933898600001

  • EID of the result in the Scopus database

    2-s2.0-85137642945