Surface changes induced by Argon plasma treatment of silicon dioxide microparticles
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F23%3A00583494" target="_blank" >RIV/68378271:_____/23:00583494 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Surface changes induced by Argon plasma treatment of silicon dioxide microparticles
Original language description
Plasma treatment is a versatile technique for surface treatment at a relatively low temperature. Silicon dioxide microparticles (average size about 1 micrometer) have been treated in an argon plasma using an inductive coupled plasma (ICP) reactor. The modified SiO2 powder was pressed into pellets and characterized by optical absorptance and photoluminescence spectroscopy. Argon bombardment at low pressure increased optical absorption of SiO2 powder as well as blue photoluminescence indicating an increase in defect states on the surface of the microparticles.
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
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OECD FORD branch
10302 - Condensed matter physics (including formerly solid state physics, supercond.)
Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2023
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
Proceedings of ADEPT - ADEPT 2023
ISBN
978-80-554-1977-0
ISSN
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e-ISSN
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Number of pages
4
Pages from-to
47-50
Publisher name
University of Žilina
Place of publication
Žilina
Event location
Podbanské
Event date
Jun 12, 2023
Type of event by nationality
EUR - Evropská akce
UT code for WoS article
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