2D analysis of sputtered species transport in high-power impulse magnetron sputtering (HiPIMS) discharge

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F24%3A00599217" target="_blank" >RIV/68378271:_____/24:00599217 - isvavai.cz</a>

Alternative codes found

RIV/00216208:11320/24:10494508

Result on the web

<a href="https://hdl.handle.net/11104/0356799" target="_blank" >https://hdl.handle.net/11104/0356799</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1063/5.0198423" target="_blank" >10.1063/5.0198423</a>

Result language

angličtina

Original language name

2D analysis of sputtered species transport in high-power impulse magnetron sputtering (HiPIMS) discharge

Original language description

Among the numerous advantages of the high-power impulse magnetron sputtering (HiPIMS) technique, the most important is the enhanced ionization degree of sputtered species contributing to the film growth. Consequently, the quality of deposited thin films is highly improved. Still, the optimization process is challenging due to the complexity associated with the intricate transport of the sputtered species, ionized or neutrals. The scarce knowledge available on the spatial distribution of these species when operating a HiPIMS discharge makes the quantitative prediction of any deposition feature particularly difficult. In this paper, we discuss the influence of experimentally controllable quantities, such as gas pressure and target current density, on the transport of sputtered titanium in non-reactive (argon) HiPIMS, namely, on the behavior of metal atoms and metal ion fluxes intercepting the substrate. Systematic quantitative measurements were performed in a diameter normal plane on a circular planar target. Hence, the 2D spatial distribution of the ionized flux fraction (IFF) and the total flux of titanium sputtered particles (deposition rate) are evaluated by biasing a quartz crystal microbalance equipped with an electron magnetic filter. The wide range of parameters we examined allows us to predict and optimize the flux of sputtered species based on complete mapping of the IFF of sputtered particles.

Czech name

—

Czech description

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Type

J_imp - Article in a specialist periodical, which is included in the Web of Science database

CEP classification

—

OECD FORD branch

10305 - Fluids and plasma physics (including surface physics)

Project

—

Continuities

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year

2024

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Journal of Applied Physics

ISSN

0021-8979

e-ISSN

1089-7550

Volume of the periodical

135

Issue of the periodical within the volume

17

Country of publishing house

US - UNITED STATES

Number of pages

14

Pages from-to

173302

UT code for WoS article

001215993100005

EID of the result in the Scopus database

2-s2.0-85192432903