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Effect of magnetron configuration on the spatial distribution of sputtered species in high-power impulse magnetron sputtering (HiPIMS) plasmas

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F25%3A00619213" target="_blank" >RIV/68378271:_____/25:00619213 - isvavai.cz</a>

  • Result on the web

    <a href="https://hdl.handle.net/11104/0365951" target="_blank" >https://hdl.handle.net/11104/0365951</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1016/j.vacuum.2025.114324" target="_blank" >10.1016/j.vacuum.2025.114324</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Effect of magnetron configuration on the spatial distribution of sputtered species in high-power impulse magnetron sputtering (HiPIMS) plasmas

  • Original language description

    This study examines the two-dimensional (2D) spatial distribution of the ionized flux fraction (IFF) and total flux of sputtered species in a non-reactive high-power impulse magnetron sputtering discharge for a peak current density of ≈1.3 A/cm2. Five magnetic configurations of the magnetron cathode, ranging from highly unbalanced to highly balanced, were systematically investigated. Flux measurements were performed using a quartz crystal microbalance with an electron magnetic filter. IFF was axially and radially scanned in the diffusion plasma in a plane normal to the target. These measurements resulted in comprehensive 2D maps of the metal ions' flux distribution within the region of particular interest, where the substrates are typically placed. The experimental findings are further compared and correlated with the modeled magnetic field distribution. Our study provides deeper insight into the impact of the magnets’ arrangement on the thin film deposition process, offering potential benefits for a wide range of applications where tailored thin film properties are essential.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database

  • CEP classification

  • OECD FORD branch

    10305 - Fluids and plasma physics (including surface physics)

Result continuities

  • Project

    <a href="/en/project/EH22_008%2F0004596" target="_blank" >EH22_008/0004596: Sensors and Detectors for Future Information Society</a><br>

  • Continuities

    I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Others

  • Publication year

    2025

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Vacuum

  • ISSN

    0042-207X

  • e-ISSN

    1879-2715

  • Volume of the periodical

    238

  • Issue of the periodical within the volume

    Aug

  • Country of publishing house

    GB - UNITED KINGDOM

  • Number of pages

    8

  • Pages from-to

    114324

  • UT code for WoS article

    001477626700001

  • EID of the result in the Scopus database

    2-s2.0-105002802582