Investigation of the magnetron balancing effect on the ionized flux fraction and deposition rate of sputtered titanium species for the high-power impulse magnetron sputtering pulses of different lengths

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F23%3A00567078" target="_blank" >RIV/68378271:_____/23:00567078 - isvavai.cz</a>

Alternative codes found

RIV/00216208:11320/23:10468538

Result on the web

<a href="https://doi.org/10.1116/6.0002309" target="_blank" >https://doi.org/10.1116/6.0002309</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1116/6.0002309" target="_blank" >10.1116/6.0002309</a>

Result language

angličtina

Original language name

Investigation of the magnetron balancing effect on the ionized flux fraction and deposition rate of sputtered titanium species for the high-power impulse magnetron sputtering pulses of different lengths

Original language description

The study is focused on the impact of different magnetic field configurations of a high-power impulse magnetron sputtering (HiPIMS) in a nonreactive mode on the film precursors. Ionized flux fraction and total flux deposited onto the substrate were measured with the magnetic quartz crystal microbalance probe placed in front of the target racetrack. Particularly, we investigated the degree of magnetron balancing and the geometry of the magnetic field above the Ti target surface (4 in. diameter), as crucial factors influencing the thin film deposition, for different HiPIMS pulse lengths. Three unbalanced (II type) magnetron configurations have been chosen for this study: two symmetric geometries—with a regular magnetic field (B parallel to the target about 80 and 35 mT) and one asymmetric (highly unbalanced) magnetron configuration with an intermediate magnetic field (B parallel to the target about 48 mT).

Czech name

—

Czech description

—

Type

J_imp - Article in a specialist periodical, which is included in the Web of Science database

CEP classification

—

OECD FORD branch

10305 - Fluids and plasma physics (including surface physics)

Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year

2023

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Journal of Vacuum Science & Technology A : Vacuum, Surfaces and Films

ISSN

0734-2101

e-ISSN

1520-8559

Volume of the periodical

41

Issue of the periodical within the volume

1

Country of publishing house

US - UNITED STATES

Number of pages

8

Pages from-to

013003

UT code for WoS article

000900746200002

EID of the result in the Scopus database

2-s2.0-85144630949