Mechanizm of the film composition formation durind magnetron sputtering of WTi.
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F01%3A02010294" target="_blank" >RIV/68378271:_____/01:02010294 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Mechanizm of the film composition formation durind magnetron sputtering of WTi.
Original language description
The WTi films were deposited by an unbalanced magnetron sputtering of WTi (70>30 at. ) alloy target. The influence of the working gas (Ar) pressure, substrate bias and substrate location on the composition of films and on the flux of atoms and ions towards a substrate and the target was studied using EPMA, RBS, quadrupole mass spectrometry etc.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BM - Solid-state physics and magnetism
OECD FORD branch
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Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2001
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Journal of Vacuum Science and Technology. A
ISSN
0734-2101
e-ISSN
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Volume of the periodical
19
Issue of the periodical within the volume
5
Country of publishing house
US - UNITED STATES
Number of pages
13
Pages from-to
2554-2566
UT code for WoS article
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EID of the result in the Scopus database
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