Formation on Ti1-xSix and Ti1-xSixN films by magnetron co-sputtering

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F99%3A00039127" target="_blank" >RIV/49777513:23520/99:00039127 - isvavai.cz</a>

Result on the web

—

DOI - Digital Object Identifier

—

Result language

angličtina

Original language name

Formation on Ti1-xSix and Ti1-xSixN films by magnetron co-sputtering

Original language description

The paper reports on surface morphology, structure and microhardness of TiSi-N films formed by cosputtering from two target-facing unbalanced magnetrons, equipped with pure Ti and Si targets, on an unheated substrate rotating in front of both targets. Thratio Si/Ti in the TiSi-N film was achieved by modifying the magnitude of currents in the individual magnetrons and by the addition of nitrogen to the film. The rotation of the substrate has a strong effect on the film deposition rate and its morphology.The deposition rate is 3 times lower than that of the film deposited on a stationary substrate. The surface roughness of a polycrystalline Ti film deposited on the rotating substrate is considerably higher than that on a stationary substrate. On the contrary, the surface of an amorphous Si film is smooth and there no difference between the roughness of Si films sputtered on stationary and on rotating substrates.

Czech name

—

Czech description

—

Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BL - Plasma physics and discharge through gases

OECD FORD branch

—

Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

1999

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Czechoslovak Journal of Physics

ISSN

00114626

e-ISSN

—

Volume of the periodical

Roč.^49

Issue of the periodical within the volume

č.^3

Country of publishing house

CZ - CZECH REPUBLIC

Number of pages

14

Pages from-to

—

UT code for WoS article

—

EID of the result in the Scopus database

—