Properties of TiSi-N films prepared by magnetron co-sputtering
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F99%3A00042458" target="_blank" >RIV/49777513:23520/99:00042458 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Properties of TiSi-N films prepared by magnetron co-sputtering
Original language description
The paper reports on surface morphology, structure and microhardness of TiSi-N films formed by cosputtering from two target-facing unbalanced magnetrons, equipped with pure Ti and Si targets, on an unheated substrate rotating in front of both targets. Thratio Si/Ti in the TiSi-N film was controlled by the magnitude of currents in the individual magnetrons and by the addition of nitrogen to the film. The rotation of the substrate has a strong effect on the deposition rate and the film morphology. The hardness of the film increases with increasing Si content. An incorporation of nitrogen in to the TiSi film also increases the film hardness. A main finding is that the microhardness strongly correlates to the film structure. The Si content in the TiSi-Nfilm has not to be a dominant parameter which ensures a maximum hardness. The Ti(26at.%)Si(8.5at.%)N(65at.%)-film sputtered on an unheated rotating steel substrate, held at a floating potential, exhibited the best results with a hardness of
Czech name
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Czech description
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Classification
Type
C - Chapter in a specialist book
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
1999
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Book/collection name
Properties of TiSi-N films prepared by magnetron co-sputtering
ISBN
8090272401
Number of pages of the result
6
Pages from-to
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Number of pages of the book
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Publisher name
AV ČR
Place of publication
Praha
UT code for WoS chapter
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