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Properties of TiSi-N films prepared by magnetron co-sputtering

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F99%3A00042458" target="_blank" >RIV/49777513:23520/99:00042458 - isvavai.cz</a>

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    Properties of TiSi-N films prepared by magnetron co-sputtering

  • Original language description

    The paper reports on surface morphology, structure and microhardness of TiSi-N films formed by cosputtering from two target-facing unbalanced magnetrons, equipped with pure Ti and Si targets, on an unheated substrate rotating in front of both targets. Thratio Si/Ti in the TiSi-N film was controlled by the magnitude of currents in the individual magnetrons and by the addition of nitrogen to the film. The rotation of the substrate has a strong effect on the deposition rate and the film morphology. The hardness of the film increases with increasing Si content. An incorporation of nitrogen in to the TiSi film also increases the film hardness. A main finding is that the microhardness strongly correlates to the film structure. The Si content in the TiSi-Nfilm has not to be a dominant parameter which ensures a maximum hardness. The Ti(26at.%)Si(8.5at.%)N(65at.%)-film sputtered on an unheated rotating steel substrate, held at a floating potential, exhibited the best results with a hardness of

  • Czech name

  • Czech description

Classification

  • Type

    C - Chapter in a specialist book

  • CEP classification

    BL - Plasma physics and discharge through gases

  • OECD FORD branch

Result continuities

  • Project

    Result was created during the realization of more than one project. More information in the Projects tab.

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Others

  • Publication year

    1999

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Book/collection name

    Properties of TiSi-N films prepared by magnetron co-sputtering

  • ISBN

    8090272401

  • Number of pages of the result

    6

  • Pages from-to

  • Number of pages of the book

  • Publisher name

    AV ČR

  • Place of publication

    Praha

  • UT code for WoS chapter