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Low peak power deposition regime in HiPIMS: Deposition of hard and dense nanocomposite Ti-Si-N films by DOMS without the need of energetic bombardment

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21230%2F20%3A00343445" target="_blank" >RIV/68407700:21230/20:00343445 - isvavai.cz</a>

  • Result on the web

    <a href="https://doi.org/10.1016/j.surfcoat.2020.125996" target="_blank" >https://doi.org/10.1016/j.surfcoat.2020.125996</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1016/j.surfcoat.2020.125996" target="_blank" >10.1016/j.surfcoat.2020.125996</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Low peak power deposition regime in HiPIMS: Deposition of hard and dense nanocomposite Ti-Si-N films by DOMS without the need of energetic bombardment

  • Original language description

    Nanocomposite Ti-Si-N thin films have been extensively studied for more than two decades mainly for the production of super hard materials. However, recently, several authors have shown that the use of HiPIMS in Ti-Si-N deposition bring about new opportunities for optimization of the films properties. HiPIMS allows for markedly different film growth pathways depending on the deposition conditions. In a previous work, regarding the deposition of Ti-Si-N films by DOMS (Deep Oscillation Magnetron Sputtering), authors also showed that, at low peak power, a unique optimal compromise of ionization fraction and energy of the sputtered species can be achieved. The main objective of the present work is to further investigate the low peak power regime in the deposition of Ti-Si-N films by DOMS. For this purpose, Ti-Si-N films with a Si content of 7 at.% were deposited by DOMS using a similar configuration as in our previous work but with fewer Si pellets placed on the Ti target in order to achieve a lower Si content.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database

  • CEP classification

  • OECD FORD branch

    20506 - Coating and films

Result continuities

  • Project

    <a href="/en/project/EF18_070%2F0010457" target="_blank" >EF18_070/0010457: International Mobility of Researchers MSCA-IF II in CTU in Prague</a><br>

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Others

  • Publication year

    2020

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Surface & Coatings Technology

  • ISSN

    0257-8972

  • e-ISSN

    1879-3347

  • Volume of the periodical

    397

  • Issue of the periodical within the volume

    September

  • Country of publishing house

    NL - THE KINGDOM OF THE NETHERLANDS

  • Number of pages

    12

  • Pages from-to

  • UT code for WoS article

    000543496400029

  • EID of the result in the Scopus database

    2-s2.0-85085840337