Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputtering
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F20%3A00533965" target="_blank" >RIV/68378271:_____/20:00533965 - isvavai.cz</a>
Result on the web
<a href="https://doi.org/10.1116/1.5145292" target="_blank" >https://doi.org/10.1116/1.5145292</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1116/1.5145292" target="_blank" >10.1116/1.5145292</a>
Alternative languages
Result language
angličtina
Original language name
Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputtering
Original language description
The sideways (radial) deposition rate and ionized flux fraction in a high power impulse magnetron sputtering (HiPIMS) discharge are studied and compared to a dc magnetron sputtering (dcMS) discharge, while the magnetic field strength and degree of balancing are varied.
Czech name
—
Czech description
—
Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
—
OECD FORD branch
10305 - Fluids and plasma physics (including surface physics)
Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2020
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Journal of Vacuum Science & Technology A : Vacuum, Surfaces and Films
ISSN
0734-2101
e-ISSN
—
Volume of the periodical
38
Issue of the periodical within the volume
3
Country of publishing house
US - UNITED STATES
Number of pages
11
Pages from-to
1-11
UT code for WoS article
000529407100003
EID of the result in the Scopus database
2-s2.0-85084281981