Magnetron with gas injection through hollow cathodes machined in sputtered target

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F01%3A00064882" target="_blank" >RIV/49777513:23520/01:00064882 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Magnetron with gas injection through hollow cathodes machined in sputtered target

Original language description

This article reports on a magnetron equipped with a target with holes. The holes machined in sputtered target can sustain hollow cathode discharges and/or inject the sputtering gas directly inside the magnetron discharge. This magnetron operates on the same principle as a gas-jet. It is shown that the size and number of holes can efficiently control I-V characteristics of the magnetron. The holes of large (>= 2 mm) diameter can sustain hollow cathode discharges, which intensify the magnetron discharge.

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BL - Plasma physics and discharge through gases

OECD FORD branch

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Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2001

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Surface and Coatings Technology

ISSN

02578972

e-ISSN

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Volume of the periodical

Vol. 148

Issue of the periodical within the volume

leden

Country of publishing house

US - UNITED STATES

Number of pages

9

Pages from-to

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UT code for WoS article

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EID of the result in the Scopus database

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