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Thermochemical etching of polycrystalline diamond films by nickel

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F25%3A00619266" target="_blank" >RIV/68378271:_____/25:00619266 - isvavai.cz</a>

  • Result on the web

    <a href="https://doi.org/10.1016/j.diamond.2025.112164" target="_blank" >https://doi.org/10.1016/j.diamond.2025.112164</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1016/j.diamond.2025.112164" target="_blank" >10.1016/j.diamond.2025.112164</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Thermochemical etching of polycrystalline diamond films by nickel

  • Original language description

    This study investigates the deep etching characteristics of microcrystalline diamond films using a Ni-catalyzed thermochemical process conducted at different temperatures (750–975 °C) and gas compositions. Under H2 microwave plasma conditions, minimal etching was observed beneath the Ni mask. Although introducing CO₂ into the gas mixture enhanced the etching rate by factors of 2–3, it resulted in non-selective etching of unmasked regions. Changing to water vapor conditions led to superior etching selectivity, though the process was still pressure-dependent. At low pressure (65 mbar), catalytic etching achieved a maximum depth of 5–6 μm due to saturated graphitization around Ni. This limitation was overcome by increasing atmospheric pressure, enabling the formation of depth structures up to 20 μm with an etching rate of 45 μm/h. Temperature-dependent studies were conducted to evaluate the etch profile evolution. Using a 200 nm thick Ni mask at 900 °C under atmospheric pressure conditions, we achieved highly anisotropic etching with vertical sidewalls, contrasting with the sloped profiles typically observed in single-crystal diamond etching. This technology presents a cost-effective alternative to conventional dry plasma etching processes for fabricating complex 3D structures.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database

  • CEP classification

  • OECD FORD branch

    20501 - Materials engineering

Result continuities

  • Project

    Result was created during the realization of more than one project. More information in the Projects tab.

  • Continuities

    I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Others

  • Publication year

    2025

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Diamond and Related Materials

  • ISSN

    0925-9635

  • e-ISSN

    1879-0062

  • Volume of the periodical

    154

  • Issue of the periodical within the volume

    April

  • Country of publishing house

    NL - THE KINGDOM OF THE NETHERLANDS

  • Number of pages

    7

  • Pages from-to

    112164

  • UT code for WoS article

    001443658500001

  • EID of the result in the Scopus database

    2-s2.0-86000346938