Improving HER and OER reactions by tailoring oxidation reactions during pulsed laser deposition of TiON thin films
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F25%3A00641772" target="_blank" >RIV/68378271:_____/25:00641772 - isvavai.cz</a>
Alternative codes found
RIV/60461373:22310/25:43933284
Result on the web
<a href="https://hdl.handle.net/11104/0371815" target="_blank" >https://hdl.handle.net/11104/0371815</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.apsadv.2025.100877" target="_blank" >10.1016/j.apsadv.2025.100877</a>
Alternative languages
Result language
angličtina
Original language name
Improving HER and OER reactions by tailoring oxidation reactions during pulsed laser deposition of TiON thin films
Original language description
Control over the gas-phase oxidation reaction during pulsed laser deposition (PLD) of 150 nm TiN films under varying O₂ atmospheres was achieved by tailoring surface oxidation states which showed a good potential for rare-metal-free water splitting. An optimum for the nitrogen occupation was found at 0.1 Pa O2, which corre-sponds to the highest deposition energies during film growth. Additionally, the increase in deposition temperature up to allows a better incorporation of nitrogen up to a value of 2.5. The deposition process was monitored via angle- and time-resolved Langmuir probe measurements combined with optical emission spectroscopy. Under residual atmosphere conditions, high kinetic ion energy which reached 1.8 keV facilitated both gas‒phase oxidation and thermal oxidation of the films. In the intermediate pressure regime, where energies where in the range of hundreds of eV, the formation of suboxides and fractional nitrides was observed, with the transition towards TiO₂ driven by increased plasma ion acceleration and increased ion density by a factor of 1.2. The integration of advanced plasma diagnostics with thin-film analysis provides a deeper understanding of the oxidation dynamics in PLD, offering valuable insights for tailoring the properties of oxynitride thin films.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10302 - Condensed matter physics (including formerly solid state physics, supercond.)
Result continuities
Project
<a href="/en/project/EH22_010%2F0008124" target="_blank" >EH22_010/0008124: MSCA Fellowships CZ FZU II</a><br>
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2025
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Applied Surface Science Advances
ISSN
2666-5239
e-ISSN
2666-5239
Volume of the periodical
30
Issue of the periodical within the volume
Dec
Country of publishing house
NL - THE KINGDOM OF THE NETHERLANDS
Number of pages
10
Pages from-to
100877
UT code for WoS article
001614829100001
EID of the result in the Scopus database
2-s2.0-105020969700