Investigations on the CuI thin films production by pulsed laser deposition

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F22%3A00562426" target="_blank" >RIV/68378271:_____/22:00562426 - isvavai.cz</a>
Result on the web
<a href="https://doi.org/10.1016/j.apsusc.2022.154868" target="_blank" >https://doi.org/10.1016/j.apsusc.2022.154868</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.apsusc.2022.154868" target="_blank" >10.1016/j.apsusc.2022.154868</a>

Result language
angličtina
Original language name
Investigations on the CuI thin films production by pulsed laser deposition
Original language description
CuI thin films were deposited by pulsed laser deposition (PLD) in various Ar atmospheres. Control over the morphology, structure and defect nature of the deposited films was attempted by in-situ plasma diagnostics. The deposited films presented stoichiometric crystallinity on the full range of experimental condition with no residual oxidation, as per XRD and XPS measurements. Band gap tailoring was achieved by controlling the plasma ion kinetic energy with optimum conditions being defined by Cu and I ionic groups with kinetic energies surpassing 200 eV. Variation in Ar pressure allowed control over the nature of vacancies from VI + Cui to predominantly VCu. In situ plasma measurements revealed that the addition of Ar leads to the preferentially scattering of the Cu ions in the plasma which subsequently leads Cu ions energy losses.
Czech name
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Czech description
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Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10302 - Condensed matter physics (including formerly solid state physics, supercond.)

Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year
2022
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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