Thin Films on the Basis of Chromium and Their Selected Properties

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21220%2F04%3A00104398" target="_blank" >RIV/68407700:21220/04:00104398 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Thin Films on the Basis of Chromium and Their Selected Properties
Original language description
From chromium based layers there were selected chromium oxide and chromium nitride layers. Metal organic chemical vapour deposition methods of layer preparation were used. The oxide layers were prepared from acetylacetonate of chromium. The nitride layers were prepared from the mixture of bis(benzene)chromium and ammonia. The temperature of deposition was carried out in the temperature range 350-6500C. The oxide layers prepared at the temperatures below 4500C were amorphous and the layers prepared at the temperature 5500C and above were generally polycrystalline. The hardness of the deposited chromium oxide layers on silicon substrates was 18-25 GPa. The hardness of the deposited chromium nitride layers on silicon substrates was 15-20GPa.
Czech name
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Czech description
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Publication year
2004
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
Proceedings of the 11th Nordic Symposium on Tribology NORDTRIB 2004
ISBN
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ISSN
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e-ISSN
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Number of pages
7
Pages from-to
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Publisher name
Norwegian University of Science and Technology
Place of publication
Trondheim
Event location
Tromso - Harstad
Event date
Jun 1, 2004
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
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