Modeling of Evaporation of Thin Films Using DOE
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21230%2F06%3A00167865" target="_blank" >RIV/68407700:21230/06:00167865 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Modeling of Evaporation of Thin Films Using DOE
Original language description
Technology of factorial experiments is used for simulation of evaporation of thin Ni films. Evaporated structures were examined from the point of view of the resistance and their thickness.
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
JA - Electronics and optoelectronics
OECD FORD branch
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Result continuities
Project
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Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2006
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
29th International Spring Seminar on Electronics Technology
ISBN
978-1-4244-0550-3
ISSN
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e-ISSN
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Number of pages
5
Pages from-to
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Publisher name
IEEE
Place of publication
New York
Event location
St. Marienthal
Event date
May 10, 2006
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
000246825800045