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Properties of Erbium Doped Hydrogenated Amorphous Carbon Layers Fabricated by Sputtering and Plasma Assisted Chemical Vapor Deposition

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21230%2F08%3A03144890" target="_blank" >RIV/68407700:21230/08:03144890 - isvavai.cz</a>

  • Alternative codes found

    RIV/60461373:22310/08:00020100

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    Properties of Erbium Doped Hydrogenated Amorphous Carbon Layers Fabricated by Sputtering and Plasma Assisted Chemical Vapor Deposition

  • Original language description

    We report about properties of carbon layers doped with Er3+ ions fabricated by Plasma Assisted Chemical Vapor Deposition (PACVD) and by sputtering on silicon or glass substrates. The structure of the samples was characterized by X-ray diffraction and their composition was determined by Rutherford Backscattering Spectroscopy and Elastic Recoil Detection Analysis. The Absorbance spectrum was taken in the spectral range from 400 nm to 600 nm. Photoluminescence spectra were obtained using two types of Ar laser (?ex=514.5 nm, lex=488 nm) and also using a semiconductor laser (?ex=980 nm). Samples fabricated by magnetron sputtering exhibited typical emission at 1530 nm when pumped at 514.5 nm.

  • Czech name

    Vlastnosti amorfních uhlíkových vrstev dotovaných erbiem připravených pomocí naprašováním a PACVD

  • Czech description

    Článek popisuje vlastnosti amorfních uhlíkových vrstev dotovaných erbiem připravených pomocí naprašováním a PACVD.

Classification

  • Type

    J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

  • CEP classification

    JA - Electronics and optoelectronics

  • OECD FORD branch

Result continuities

  • Project

    <a href="/en/project/GA102%2F06%2F0424" target="_blank" >GA102/06/0424: New components of the integrated optics made by the planar hybrid technology</a><br>

  • Continuities

    Z - Vyzkumny zamer (s odkazem do CEZ)

Others

  • Publication year

    2008

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Acta Polytechnica

  • ISSN

    1210-2709

  • e-ISSN

  • Volume of the periodical

    48

  • Issue of the periodical within the volume

    1

  • Country of publishing house

    CZ - CZECH REPUBLIC

  • Number of pages

    7

  • Pages from-to

  • UT code for WoS article

  • EID of the result in the Scopus database