A simple model for the deposition of W-O coatings by reactive gas pulsing process
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21230%2F08%3A06145482" target="_blank" >RIV/68407700:21230/08:06145482 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
A simple model for the deposition of W-O coatings by reactive gas pulsing process
Original language description
The conventional and RGPP process parameters (target potential, total pressure and deposition rate) and the corresponding chemical composition were used to build a simple model predicting the deposition rate and the average chemical composition of the coatings deposited by RGPP as a function of the pulsing parameters. It was shown that the measured total pressure could be used to calculate the deposition rate and the chemical composition of the RGPP coatings with reasonable precision.
Czech name
Jednoduchy model pro depozici W-O vrstev magnetronovym naprasovanim s pulzovanim reaktivniho plynu
Czech description
Jednoduchy model pro depozici W-O vrstev reaktivnim magnetronovym naprasovanim s pulsovanim kysliku.
Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
JI - Composite materials
OECD FORD branch
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Result continuities
Project
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Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2008
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
The European Physical Journal Applied Physics
ISSN
1286-0042
e-ISSN
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Volume of the periodical
43
Issue of the periodical within the volume
3
Country of publishing house
FR - FRANCE
Number of pages
5
Pages from-to
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UT code for WoS article
000258652300010
EID of the result in the Scopus database
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