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Advanced x-ray optics with Si wafers and slumped glass

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21230%2F09%3A00163008" target="_blank" >RIV/68407700:21230/09:00163008 - isvavai.cz</a>

  • Alternative codes found

    RIV/67985815:_____/09:00337793 RIV/68407700:21340/09:00163008

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    Advanced x-ray optics with Si wafers and slumped glass

  • Original language description

    We report on the continuation of the development of test samples of astronomical x-ray optics based on thermally formed glass foils and on bent Si wafers. Experiments with thermal glass forming have continued adding wider range of evaluated and optimizedparameters including viscosity and internal stress analyses, as well as investigation of mounting influences. Experiments with Si wafers focused on their quality improvements such as flatness and thickness uniformity in order to better meet the requirements of future X-ray astronomy projects applications, as well as on study of their surface quality, defects analysis, and methods for its reproducible measurement.

  • Czech name

  • Czech description

Classification

  • Type

    D - Article in proceedings

  • CEP classification

    JA - Electronics and optoelectronics

  • OECD FORD branch

Result continuities

  • Project

    Result was created during the realization of more than one project. More information in the Projects tab.

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Others

  • Publication year

    2009

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Article name in the collection

    Optics for EUV, X-Ray, and Gamma-Ray Astronomy IV

  • ISBN

    978-0-8194-7727-9

  • ISSN

    0277-786X

  • e-ISSN

  • Number of pages

    12

  • Pages from-to

  • Publisher name

    SPIE

  • Place of publication

    Bellingham

  • Event location

    San Diego, California

  • Event date

    Aug 2, 2009

  • Type of event by nationality

    WRD - Celosvětová akce

  • UT code for WoS article