TiOx Films Deposited by Plasma Enhanced Chemical Vapour Deposition Method in Atmospheric Dielectric Barrier Discharge Plasma
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21230%2F12%3A00196699" target="_blank" >RIV/68407700:21230/12:00196699 - isvavai.cz</a>
Result on the web
<a href="http://download.springer.com/static/pdf/372/art%253A10.1007%252Fs11090-012-9401-0.pdf?auth66=1351696285_b7ae346d64f3dc0c16f3f2273f03605b&ext=.pdf" target="_blank" >http://download.springer.com/static/pdf/372/art%253A10.1007%252Fs11090-012-9401-0.pdf?auth66=1351696285_b7ae346d64f3dc0c16f3f2273f03605b&ext=.pdf</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1007/s11090-012-9401-0" target="_blank" >10.1007/s11090-012-9401-0</a>
Alternative languages
Result language
angličtina
Original language name
TiOx Films Deposited by Plasma Enhanced Chemical Vapour Deposition Method in Atmospheric Dielectric Barrier Discharge Plasma
Original language description
The plasma enhanced chemical vapour deposition method applying atmospheric dielectric barrier discharge (ADBD) plasma was used for TiOx thin films deposition employing titanium (IV) isopropoxide and oxygen as reactants, and argon as a working gas. ADBD was operated in the filamentary mode. The films were deposited on glass. The films0 chemical composition, surface topography, wettability and aging were analysed, particularly the dependence between precursor and reactant concentration in the discharge atmosphere and its impact on TiOx films properties. Titanium in films near the surface area was oxidized, the dominating species being TiO2 and substoichiometric titanium oxides. The films exhibited contamination with carbon, as a result of atmospheric oxygen and carbon dioxide reactions with radicals in films. No relevant difference of the film surface due to oxygen concentration inside the reactor was determined. The films were hydrophilic immediately after deposition, afterwards their w
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
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Continuities
S - Specificky vyzkum na vysokych skolach
Others
Publication year
2012
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
PLASMA CHEMISTRY AND PLASMA PROCESSING
ISSN
0272-4324
e-ISSN
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Volume of the periodical
32
Issue of the periodical within the volume
146
Country of publishing house
US - UNITED STATES
Number of pages
11
Pages from-to
1215-1225
UT code for WoS article
000310321800007
EID of the result in the Scopus database
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