Diamond Films for Implantable Electrodes

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21230%2F12%3A00198281" target="_blank" >RIV/68407700:21230/12:00198281 - isvavai.cz</a>
Alternative codes found
RIV/68407700:21460/12:00198281
Result on the web
<a href="http://ctn.cvut.cz/ap/" target="_blank" >http://ctn.cvut.cz/ap/</a>
DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Diamond Films for Implantable Electrodes
Original language description
Diamond is a promising material for implantable electrodes due to its unique properties. The aim of this work is to investigate the growth of boron-doped nanocrystalline diamond (B-NCD) films by plasma-enhanced microwave chemical vapor deposition at various temperatures, and to propose optimal diamond growth conditions for implantable electrodes. We have investigated the temperature dependence (450 °C-820 °C) of boron incorporation, surface morphology and growth rate on a polished quartz plate. Surfacemorphology and thickness were examined by atomic force microscopy (AFM).The quality of the films in terms of diamond and non-diamond phase of carbon was investigated by Raman spectroscopy. AFM imaging showed that the size of the grains was determined mainly by the thickness of the films, and varied from an average size of 40 nm in the lowest temperature sample to an average size of 150 nm in the sample prepared at the highest temperature. The surface roughness of the measured samples var
Czech name
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Czech description
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Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BO - Biophysics
OECD FORD branch
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Publication year
2012
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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