ZNO THIN FILMS PREPARED BY REACTIVE MAGNETRON SPUTTERING

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21230%2F16%3A00304154" target="_blank" >RIV/68407700:21230/16:00304154 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

ZNO THIN FILMS PREPARED BY REACTIVE MAGNETRON SPUTTERING

Original language description

The DC reactive magnetron sputtering of metallic target in oxide atmosphere is a simple method of depositing the undoped (intrinsic) polycrystalline layers of metal oxides. We have optimized the deposition of zinc oxide (ZnO) thin films on fused silica substrates and investigated the localized defect states below the optical absorption edge down to 0,01% using photothermal deflection spectroscopy (PDS) in a broad spectral range from UV to IR. We have shown that the defect density, the optical absorptance and the related optical attenuation in planar waveguides can be significantly reduced by annealing in air at 400°C.

Czech name

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Czech description

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Type

D - Article in proceedings

CEP classification

JA - Electronics and optoelectronics

OECD FORD branch

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Project

<a href="/en/project/FR-TI3%2F797" target="_blank" >FR-TI3/797: *Investigation and development of technology of the polymer optical selective components for informatics and sensors</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2016

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection

NANOCON 2016 LIST OF ABSTRACTS

ISBN

978-80-87294-68-0

ISSN

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e-ISSN

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Number of pages

6

Pages from-to

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Publisher name

TANGER

Place of publication

Ostrava

Event location

Brno

Event date

Oct 19, 2016

Type of event by nationality

WRD - Celosvětová akce

UT code for WoS article

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