All

What are you looking for?

All
Projects
Results
Organizations

Quick search

  • Projects supported by TA ČR
  • Excellent projects
  • Projects with the highest public support
  • Current projects

Smart search

  • That is how I find a specific +word
  • That is how I leave the -word out of the results
  • “That is how I can find the whole phrase”

Evaluation of bias voltage-dependent mechanical properties of amorphous TiSi2 thin films on PEEK by nano-characterization techniques

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21230%2F21%3A00346658" target="_blank" >RIV/68407700:21230/21:00346658 - isvavai.cz</a>

  • Result on the web

    <a href="https://doi.org/10.1016/j.surfcoat.2021.126859" target="_blank" >https://doi.org/10.1016/j.surfcoat.2021.126859</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1016/j.surfcoat.2021.126859" target="_blank" >10.1016/j.surfcoat.2021.126859</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Evaluation of bias voltage-dependent mechanical properties of amorphous TiSi2 thin films on PEEK by nano-characterization techniques

  • Original language description

    Thin films on PEEK have been designing by magnetron sputtering, using bias voltages ranging from -31 to -157 V. The X-ray diffraction and EDX show how the amorphous films resulting have an elemental composition very close to the stoichiometry TiSi2. The AFM and SEM performed on top and cross-section, respectively, of film reveal a smooth and uniform surface, free of pores and cracks, and a compact microstructure. The evaluation of the resolved shear stress, yield strength, hardness, scratch resistance, and fracture toughness show how these values increase in the TiSi2/PEEK system as the bias voltage increase. The development of these hard and tough thin films has enabled the fracture toughness achieved by the TiSi2/PEEK system increase when a bias voltage equal to or higher than -108 V is used during the deposition process. For these bias conditions, the compressive residual stresses generated are large enough to prevent crack nucleation. The increase of the crack resistance gives as a result that KI reaches values above 32 MPa*m1/2. This value is much greater than those values corresponding to the classic ceramic coatings, such as Al2O3 (4.6 MPa*m1/2) and ZrO2 (7.6 MPa*m1/2).

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database

  • CEP classification

  • OECD FORD branch

    20506 - Coating and films

Result continuities

  • Project

    <a href="/en/project/GP14-32801P" target="_blank" >GP14-32801P: Novel preparation route of metallic coatings for medical applications</a><br>

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Others

  • Publication year

    2021

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Surface and Coatings Technology

  • ISSN

    0257-8972

  • e-ISSN

    1879-3347

  • Volume of the periodical

    409

  • Issue of the periodical within the volume

    March

  • Country of publishing house

    NL - THE KINGDOM OF THE NETHERLANDS

  • Number of pages

    10

  • Pages from-to

  • UT code for WoS article

    000654045600048

  • EID of the result in the Scopus database

    2-s2.0-85099810229