Optical and Electrical Properties of W-O-N Coatings Deposited by DC Reactive Sputtering
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21260%2F07%3A06139519" target="_blank" >RIV/68407700:21260/07:06139519 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Optical and Electrical Properties of W-O-N Coatings Deposited by DC Reactive Sputtering
Original language description
Tungsten oxynitride films (W-O-N) were prepared by DC reactive magnetron sputtering in a wide range of compositions from tungsten nitride (WN) to tungsten oxide (WO3), by changing the oxygen and nitrogen flows, fO2 and fN2, respectively, and their electrical and optical properties were evaluated with respect to the structure.
Czech name
Optické a elektrické vlastnosti WON vrstev deponovaných dc magnetronem
Czech description
Optické a elektrické vlastnosti WON vrstev deponovaných dc magnetronem byly nalyzovány s ohledem na jejich strukturu.
Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BM - Solid-state physics and magnetism
OECD FORD branch
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Result continuities
Project
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Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2007
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Plasma Processes and Polymers
ISSN
1612-8850
e-ISSN
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Volume of the periodical
4
Issue of the periodical within the volume
S1
Country of publishing house
DE - GERMANY
Number of pages
7
Pages from-to
69-75
UT code for WoS article
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EID of the result in the Scopus database
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