WO3 and WO3-x thin films prepared by DC hollow cathode discharge

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F22%3A00555890" target="_blank" >RIV/68378271:_____/22:00555890 - isvavai.cz</a>

Alternative codes found

RIV/60461373:22310/22:43922672

Result on the web

<a href="https://doi.org/10.1016/j.vacuum.2021.110679" target="_blank" >https://doi.org/10.1016/j.vacuum.2021.110679</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.vacuum.2021.110679" target="_blank" >10.1016/j.vacuum.2021.110679</a>

Result language

angličtina

Original language name

WO3 and WO3-x thin films prepared by DC hollow cathode discharge

Original language description

Photoactive semiconducting crystalline films of non-stoichiometric tungsten oxides (WO3-x, 0 ≤ x ≤ 3) were deposited by DC hollow cathode discharge from a tungsten nozzle in a reactive Ar + O2 atmosphere. The ratio of tungsten to oxygen in the layer was driven by controlling the O2 flow. All layers were prepared on soda-lime glass substrate (SLG) and on glass substrates coated with an FTO thin film and after deposition were annealed in air or argon atmosphere. The properties of WO3-x layers were analyzed with respect to their potential applications. Surface morphology was analyzed by SEM, qualitative phase analysis by XRD and Raman spectroscopy, chemical composition by EDX and photoactivity of individual samples by linear voltammetry. The layers stoichiometrically closest to WO3 and annealed in an argon atmosphere showed the highest photoactivity response.

Czech name

—

Czech description

—

Type

J_imp - Article in a specialist periodical, which is included in the Web of Science database

CEP classification

—

OECD FORD branch

10305 - Fluids and plasma physics (including surface physics)

Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2022

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Vacuum

ISSN

0042-207X

e-ISSN

1879-2715

Volume of the periodical

195

Issue of the periodical within the volume

Jan

Country of publishing house

GB - UNITED KINGDOM

Number of pages

10

Pages from-to

110679

UT code for WoS article

000732993600005

EID of the result in the Scopus database

2-s2.0-85117190905