WO3 and WO(3-x) thin thin films prepared by DC hollow cathode discharge
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11310%2F22%3A10437229" target="_blank" >RIV/00216208:11310/22:10437229 - isvavai.cz</a>
Result on the web
<a href="https://verso.is.cuni.cz/pub/verso.fpl?fname=obd_publikace_handle&handle=y-69llev.N" target="_blank" >https://verso.is.cuni.cz/pub/verso.fpl?fname=obd_publikace_handle&handle=y-69llev.N</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.vacuum.2021.110679" target="_blank" >10.1016/j.vacuum.2021.110679</a>
Alternative languages
Result language
angličtina
Original language name
WO3 and WO(3-x) thin thin films prepared by DC hollow cathode discharge
Original language description
Photoactive semiconducting crystalline films of non-stoichiometric tungsten oxides (WO(3-x), 0 < x < 3) were deposited by DC hollow cathode discharge from a tungsten nozzle in a reactive Ar + O2 atmosphere. The ratio of tungsten to oxygen in the layer was driven by controlling the O2 flow. All layers were prepared on soda-lime glass substrate (SLG) and on glass substrates coated with an FTO thin film and after deposition were annealed in air or argon atmosphere. The properties of WO(3-x) layers were analyzed with respect to their potential applications. Surface morphology was analyzed by SEM, qualitative phase analysis by XRD and Raman spectroscopy, chemical composition by EDX and photoactivity of individual samples by linear voltammetry. The layers stoichiometrically closest to WO3 and annealed in an argon atmosphere showed the highest photoactivity response.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10402 - Inorganic and nuclear chemistry
Result continuities
Project
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Continuities
S - Specificky vyzkum na vysokych skolach<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2022
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Vacuum
ISSN
0042-207X
e-ISSN
1879-2715
Volume of the periodical
195
Issue of the periodical within the volume
January
Country of publishing house
GB - UNITED KINGDOM
Number of pages
10
Pages from-to
110679
UT code for WoS article
000732993600005
EID of the result in the Scopus database
2-s2.0-85117190905