Copper tungsten oxide (CuxWOy) thin films for optical and photoelectrochemical applications deposited by reactive high power impulse magnetron co-sputtering
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F22%3A00566773" target="_blank" >RIV/68378271:_____/22:00566773 - isvavai.cz</a>
Alternative codes found
RIV/61989592:15310/22:73617290
Result on the web
<a href="https://hdl.handle.net/11104/0338068" target="_blank" >https://hdl.handle.net/11104/0338068</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1063/5.0123075" target="_blank" >10.1063/5.0123075</a>
Alternative languages
Result language
angličtina
Original language name
Copper tungsten oxide (CuxWOy) thin films for optical and photoelectrochemical applications deposited by reactive high power impulse magnetron co-sputtering
Original language description
Copper tungsten oxide films are deposited with the help of reactive high power impulse magnetron sputtering (HiPIMS) in an argon/oxygen gas mixture. Two magnetrons, one equipped with a tungsten target and the other with a copper target, are employed. The HiPIMS discharge is operated with a repetition frequency of f ¼ 100 Hz. Pulse widths of 100 and 20 μs separated by 25 μs are chosen for the tungsten and copper target, respectively. Films deposited on two different glass substrates [soda lime glass and fluorine doped tin oxide (FTO) coated glass] are characterized by energy dispersive x-ray spectroscopy, x-ray photoelectron spectroscopy, x-ray diffraction, Raman spectroscopy, and ellipsometry. Photoelectrochemical activity was investigated by linear voltammetry. Annealed films deposited on FTO glass are composed of WO3 and CuWO4 or Cu2WO4 crystal phases.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
20506 - Coating and films
Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2022
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Journal of Applied Physics
ISSN
0021-8979
e-ISSN
1089-7550
Volume of the periodical
132
Issue of the periodical within the volume
21
Country of publishing house
US - UNITED STATES
Number of pages
13
Pages from-to
215301
UT code for WoS article
000894517100001
EID of the result in the Scopus database
2-s2.0-85144137293