Photo-electrochemical stability of copper oxide photocathodes deposited by reactive high power impulse magnetron sputtering

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F19%3A00512095" target="_blank" >RIV/68378271:_____/19:00512095 - isvavai.cz</a>
Alternative codes found
RIV/60461373:22310/19:43918610
Result on the web
<a href="https://doi.org/10.1016/j.cattod.2018.11.034" target="_blank" >https://doi.org/10.1016/j.cattod.2018.11.034</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.cattod.2018.11.034" target="_blank" >10.1016/j.cattod.2018.11.034</a>

Result language
angličtina
Original language name
Photo-electrochemical stability of copper oxide photocathodes deposited by reactive high power impulse magnetron sputtering
Original language description
Copper oxide thin films were deposited by a reactive high power impulse magnetron sputtering (r-HIPIMS) on glass substrates with a SnO2:F (FTO) layer. The pulse magnetron discharge was analyzed via the radio frequency (RF) Sobolewski probe, used for the time-resolved measurement of ion flux density on the substrate. Pulsed discharge current and voltage waveforms were analyzed.n
Czech name
—
Czech description
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Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10302 - Condensed matter physics (including formerly solid state physics, supercond.)

Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
2019
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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