Thin TiCN films prepared by hybrid magnetron-laser deposition

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F07%3A00086725" target="_blank" >RIV/68378271:_____/07:00086725 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Thin TiCN films prepared by hybrid magnetron-laser deposition
Original language description
Titanium carbonitride thin films were prepared by hybrid deposition arrangement combining DC magnetron sputtering and KrF pulsed laser deposition. Carbon and titanium species were simultaneously deposited on the same rotated Si substrate. Films were fabricated at room substrate temperature in argon-nitrogen ambient atmosphere, for laser fluence of 15 J.cm-2 and magnetron power of 150 W. Film properties were modified by RF discharge held between the target and substrate. Films were studied by XRD and glow discharge optical emission spectroscopy (GDOES). Mechanical and electronic properties (XPS) were also measured.
Czech name
Tenké vrstvy TiCN připravené hybridní magnetron- laserovou depozicí
Czech description
Titan-karbonitridové vrstvy byly připraveny hybridním depozičním systémem kombinujícím DC magnetron a KrF laser. Vrstvy byly připraveny za pokojové teploty a v dusíkovém okolí při hustotě laserové energie 15 Jcm-2 a výkonu magnetronu 150 W. Vrstvy byly charakterizovány metodami XRD, GDOES a XPS.

Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BH - Optics, masers and lasers
OECD FORD branch
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Project
<a href="/en/project/GA202%2F06%2F0216" target="_blank" >GA202/06/0216: Study of plasma formed in hybrid arrangement of pulsed laser deposition</a><br>
Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year
2007
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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