Study of Thin TiCxN1-x Films Fabricated by Hybrid Magnetron-Laser Deposition

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21460%2F05%3A00117729" target="_blank" >RIV/68407700:21460/05:00117729 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Study of Thin TiCxN1-x Films Fabricated by Hybrid Magnetron-Laser Deposition

Original language description

Titanium- carbonitride thin films were grown at room temperature using a hybrid deposition arrangement combining DC magnetron sputtering and KrF pulsed laser deposition (MSPLD). Carbon and titanium were simultaneously deposited on the same Si substrate,dimensions of 3 cm x 3 cm. Films were fabricated in argon-nitrogen atmosphere of 1 Pa - 5 Pa, for laser fluence of 15 Jcm(-2) and magnetron power of 150 W. Film properties were modified by RF discharge held between the target and substrate. Film crystallinity was studied by XRD and the composition depth profile of TiCN layers by glow discharge optical emission spectroscopy (GDOES).

Czech name

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Czech description

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Type

D - Article in proceedings

CEP classification

BH - Optics, masers and lasers

OECD FORD branch

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Project

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Continuities

V - Vyzkumna aktivita podporovana z jinych verejnych zdroju

Publication year

2005

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection

Photonics Prague 2005

ISBN

80-86742-08-3

ISSN

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e-ISSN

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Number of pages

1

Pages from-to

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Publisher name

Agentura Action

Place of publication

Praha

Event location

Prague

Event date

Jun 8, 2005

Type of event by nationality

EUR - Evropská akce

UT code for WoS article

000236543600016